2578-3769

Journal of Microelectronic Manufacturing

Journal of Microelectronic Manufacturing

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DOIs for this ISSN

Showing the top 5 of 62 DOIs, ordered by correction priority.

# Title Missing Priority Citations
1 EUV Lithography: State-of-the-Art Review (10.33079/jomm.19020202)
Abstract References ORCID License
188.65 76
2 Recent Advances in Organic-inorganic Hybrid Photoresists (10.33079/jomm.21040101)
Abstract References ORCID License
117.61 14
3 Generative Learning in VLSI Design for Manufacturability: Cu… (10.33079/jomm.19020401)
Abstract References ORCID License
107.92 11
4 A Photolithography Process Design for 5 nm Logic Process Flo… (10.33079/jomm.19020408)
Abstract References ORCID License
104.14 10
5 Metrology Challenges in 3D NAND Flash Technical Development… (10.33079/jomm.20030102)
Abstract References ORCID License
95.42 8
6 The 2017 IRDS Lithography Roadmap (10.33079/jomm.18010204)
Abstract References ORCID License
77.82 5
7 The Variables and Invariants in the Evolution of Logic Optic… (10.33079/jomm.19020101)
Abstract References ORCID License
77.82 5
8 Nano-Electronic Simulation Software (NESS): A Novel Open-Sou… (10.33079/jomm.20030404)
Abstract References ORCID License
77.82 5
9 The Effect of Fin Structure in 5 nm FinFET Technology (10.33079/jomm.19020405)
Abstract References ORCID License
69.90 4
10 Study of Inverse Lithography Approaches based on Deep Learni… (10.33079/jomm.20030301)
Abstract References ORCID License
69.90 4
11 Silicon Nitride Etch via Oxidation Reaction in Fluorocarbon/… (10.33079/jomm.18010102)
Abstract References ORCID License
60.21 3
12 BSIM-CMG Compact Model for IC CAD: from FinFET to Gate-All-A… (10.33079/jomm.20030402)
Abstract References ORCID License
60.21 3
13 Enabling Variability-Aware Design-Technology Co-Optimization… (10.33079/jomm.20030409)
Abstract References ORCID License
60.21 3
14 Development and Prospect of Process Models and Simulation Me… (10.33079/jomm.19020204)
Abstract References ORCID License
47.71 2
15 Current Status of the Integrated Circuit Industry in China ―… (10.33079/jomm.19020305)
Abstract References ORCID License
47.71 2
16 Fast and Accurate Machine Learning Inverse Lithography Using… (10.33079/jomm.20030407)
Abstract References ORCID License
47.71 2
17 Analysis of Current Research Status of Plasma Etch Process M… (10.33079/jomm.18010104)
Abstract References ORCID License
30.10 1
18 Current Status of the Integrated Circuit Industry in China (10.33079/jomm.18010105)
Abstract References ORCID License
30.10 1
19 Compressive Sensing Approaches for Lithographic Source and M… (10.33079/jomm.18010202)
Abstract References ORCID License
30.10 1
20 Hamamatsu’s Products for Optical Inspection, Metrology and M… (10.33079/jomm.19020102)
Abstract References ORCID License
30.10 1
21 Laser-Driven Light Sources for Nanometrology Applications (10.33079/jomm.19020104)
Abstract References ORCID License
30.10 1
22 Current Status of the Integrated Circuit Industry in China ―… (10.33079/jomm.19020205)
Abstract References ORCID License
30.10 1
23 Innovation on Line Cut Methods of Self-aligned Multiple Patt… (10.33079/jomm.19020301)
Abstract References ORCID License
30.10 1
24 A Simulation Study for Typical Design Rule Patterns in 5 nm… (10.33079/jomm.19020406)
Abstract References ORCID License
30.10 1
25 DFM: “Design for Manufacturing” or “Design Friendly Manufact… (10.33079/jomm.20030101)
Abstract References ORCID License
30.10 1
26 Key Process Approach Recommendation for 5 nm Logic Process F… (10.33079/jomm.20030103)
Abstract References ORCID License
30.10 1
27 A Device Design for 5 nm Logic FinFET Technology (10.33079/jomm.20030105)
Abstract References ORCID License
30.10 1
28 Recent Progress of the Integrated Circuit Industry in China… (10.33079/jomm.20030304)
Abstract References ORCID License
30.10 1
29 First-principles Simulations of Tunneling FETs Based on van… (10.33079/jomm.20030405)
Abstract References ORCID License
30.10 1
30 Material Modeling in Semiconductor Process Applications (10.33079/jomm.20030406)
Abstract References ORCID License
30.10 1
31 Pattern-Centric Computational System for Logic and Memory Ma… (10.33079/jomm.20030410)
Abstract References ORCID License
30.10 1
32 Fast and Robust DCNN Based Lithography SEM Image Contour Ext… (10.33079/jomm.21040102)
Abstract References ORCID License
30.10 1
33 Foreword to the Journal of Microelectronic Manufacturing Gen… (10.33079/jomm.18010101)
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0.00 0
34 A Novel High Volume Manufacturing Method for Defect-free and… (10.33079/jomm.18010103)
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0.00 0
35 Preparation of Double-sided Nanostructure Based on Soft-nano… (10.33079/jomm.18010201)
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0.00 0
36 Variational Level-set Formulation for Lithographic Source an… (10.33079/jomm.18010203)
Abstract References ORCID License
0.00 0
37 Hotspot Detection of Semiconductor Lithography Circuits Base… (10.33079/jomm.18010205)
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0.00 0
38 Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen P… (10.33079/jomm.19020103)
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0.00 0
39 Current Status of the Integrated Circuit Industry in China ―… (10.33079/jomm.19020105)
Abstract References ORCID License
0.00 0
40 Hard IP Core Nondestructive Testing Technology (10.33079/jomm.19020201)
Abstract References ORCID License
0.00 0
41 Patterning Defect Study for Process Integration Engineering… (10.33079/jomm.19020203)
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0.00 0
42 A Flexible Pressure Sensor Based on Poly(dimethylsiloxane) N… (10.33079/jomm.19020302)
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0.00 0
43 Influence of Chemical Stability on the Fabrication of MnGa-b… (10.33079/jomm.19020303)
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0.00 0
44 An Innovative Method to Improve Model Accuracy by Implementi… (10.33079/jomm.19020304)
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0.00 0
45 Dual Micro-power 150mA Ultra LDO CMOS Regulator with fast st… (10.33079/jomm.19020402)
Abstract References ORCID License
0.00 0
46 Novel Pattern-Centric Solution for XtackingTM AFM Metrology (10.33079/jomm.19020403)
Abstract References ORCID License
0.00 0
47 Self-assembly of Blended PS-b-P2VP Block Copolymers (10.33079/jomm.19020404)
Abstract References ORCID License
0.00 0
48 White Light Interference Solution for Novel 3D NAND VIA Dish… (10.33079/jomm.19020407)
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0.00 0
49 Current Status of the Integrated Circuit Industry in China ―… (10.33079/jomm.19020409)
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0.00 0
50 A Study of 2D Assist Feature Placement (10.33079/jomm.20030104)
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0.00 0